SINGAPORE
B231
Information & Communication 信息通信-Semiconductor Equipment and Manufacturing 半导体设备及制造, Information & Communication 信息通信-Semiconductor Material 半导体材料, Information & Communication 信息通信-Instrument 仪器仪表
Semiconductor Equipment 半导体设备, Semiconductor Manufacturing 半导体制造, Optical Material 光学材料
• Lowest scatter values and defect densities: A critical factor for high-performance optics, ensuring minimal light loss and distortion
• Coating of large substrates, up to 600 mm
• Highest uniformities: Delivers consistent and repeatable coatings across the entire substrate surface with uniformities of 0.3%
• Lowest defect densities: The mask-less deposition process and operation without a shutter minimize the risk of defects, further enhancing coating quality
• Coating of curved and large substrates: Designed to accommodate complex geometries
• Highest flexibility of target material: Broad compatibility with various target materials, enabling a wide range of optical coatings
Semiconductor Equipment 半导体设备
Semiconductor Manufacturing 半导体制造